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Aug 06, 2026
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NANO 208 - Patterning and Materials Modification for Nanotechnology
PREREQUISITES: NANO 202 - Characterization and Testing of Nanotechnology Structures and Materials and NANO 203 - Basic Nanotechnology Processes .
PROGRAM: Nanotechnology
CREDIT HOURS MIN: 3
LECTURE HOURS MIN: 2
LAB HOURS MIN: 2
DATE OF LAST REVISION: Spring, 2019
COURSE DESCRIPTION: This course is an in-depth review of processing techniques and specialty equipment used in advanced pattern transfer and property modification in nanofabrication. Common and unique pattern transfer techniques will be studied with a focus on optical lithography. Materials modification through etching, functionalization, oxidation, and doping will also be covered
MAJOR COURSE LEARNING OBJECTIVES: Upon successful completion of this course the student will be expected to:
- Describe and Analyze in pattern transfer processes.
- Perform single and multilayer photolithography.
- Perform micro-contact printing and surface modifications through functionalization.
- Design, plan, and perform fabrication procedures used to chemically and physically modify Nanomaterials.
- Evaluate and design plasma etch recipes for specific etch profiles.
- Document thermal oxidation of materials and the use of dielectrics.
- Perform electrical evaluations on doped materials.
COURSE CONTENT: Topical areas of study include -
- Advanced Lithography Techniques and Tool Technologies
- Resists for Photolithography and Electron Beam Lithography
- Novel Lithography Techniques
- Dry/Chemical Plasma Etching
- Advanced Etch Systems
- Oxidation and Dielectric Materials
- Doping and Ion Implantation
Course Addendum - Syllabus (Click to expand)
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