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Nov 04, 2026
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NANO 205 - Patterning for Nanotechnology
PREREQUISITES: NANO 111 - Materials Safety and Equipment Overview for Nanotechnology , and NANO 202 - Characterization and Testing of Nanotechnology Structures and Materials , and NANO 203 - Basic Nanotechnology Processes .
PROGRAM: Nanotechnology
CREDIT HOURS MIN: 3
LECTURE HOURS MIN: 2
LAB HOURS MIN: 2
DATE OF LAST REVISION: Spring, 2019
This course is a hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment including probe techniques; stamping and embossing; e-beam; and optical contact and stepper systems. The course is divided into five major sections: pattern generation processes, photolithography, particle beam lithographic techniques, stamp lithography, and novel lithography techniques.
MAJOR COURSE LEARNING OBJECTIVES: Upon successful completion of this course the student will be expected to:
- Have strong knowledge in pattern generation processes.
- Fully understand and perform photolithography.
- Have strong knowledge in particle beam lithographic techniques.
- Understand probe pattern generation and microcontact printing.
- Have strong knowledge in stamp lithography.
- Understand self-assembled lithography.
COURSE CONTENT: Topical areas of study include -
- Advanced Lithography General Information
- Advanced Lithography Tool Technologies
- Advanced Lithography and Resists
- Novel Lithography Techniques
- Novel Lithography Techniques: Block Copolymer Patterning
Course Addendum - Syllabus (Click to expand)
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